Handbook of Thin Film Deposition Processes and Techniques. by Krisna Seshan (Eds.)

By Krisna Seshan (Eds.)

Content material:
Foreword

, Pages ix-x, Gordon E. Moore
Preface to the second one Edition

, Pages xi-xii, Krishna Seshan
Preface to the 1st Edition

, Pages xiii-xiv, Klaus okay. Schuegraf
Contributors

, Pages xv-xvi
Recent alterations within the Semiconductor Industry

, Pages 1-9, Krishna Seshan
1 - Deposition applied sciences and functions: advent and Overview

, Pages 11-43, Werner Kern, Klaus ok. Schuegraf
2 - Silicon Epitaxy through Chemical Vapor Deposition

, Pages 45-110, Martin L. Hammond
3 - Chemical Vapor Deposition of Silicon Dioxide Films

, Pages 111-150, John Foggiato
4 - steel natural Chemical Vapor Deposition: know-how and Equipment

, Pages 151-203, John L. Zilko
5 - function Scale Modeling

, Pages 205-240, Vivek Singh
6 - The position Of Metrology And Inspection In Semiconductor Processing

, Pages 241-286, Mark Keefer, Rebecca Pinto, Cheri Dennison, James Turlo
7 - illness keep watch over, disorder Detection, and Yield Enhancement in Gigabit Manufacturing

, Pages 287-318, Suresh Bhat, Krishna Seshan
8 - Sputtering and Sputter Deposition

, Pages 319-348, Stephen Rossnagel
9 - Laser and Electron Beam Assisted Processing

, Pages 349-379, Cameron A. Moore, Zeng-qi Yu, Lance R. Thompson, George J. Collins
10 - Molecular Beam Epitaxy: gear and Practice

, Pages 381-461, Walter S. Knodle, Robert Chow
11 - Ion Beam Deposition

, Pages 463-499, John R. McNeil, James J. McNally, Paul D. Reader
12 - Chemical Mechanical Polishing

, Pages 501-512, Kenneth C. Cadien
13 - natural Dielectrics in Multilevel Metallization of built-in Circuits

, Pages 513-593, Krishna Seshan, Dominic J. Schepis, Laura B. Rothman
14 - functionality, Processing, and Lithography Trends

, Pages 595-607, Krishna Seshan
Index

, Pages 609-629

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Additional info for Handbook of Thin Film Deposition Processes and Techniques. Principles, Methods, Equipment and Applicatios

Sample text

5, pp. 213–297 in Ref. ­See also numerous excellent papers in Proc. Ninth Internat. Conf. on Chemical Vapor Deposition 1984, (M. Robinson, C. H. J. van den Brekel, G. W. Cullen, and J. M. ), Vol. 84-6, The Electrochem. Soc. , Semiconductor International, 9(11):46–51 (Nov. ­Mawst, L. , Emanuel, M. , Givens, M. , Zmudzinski, C. A. and Coleman, J. , Semiconductor International, 9(11):61–63 (Nov. ­Peters, J. , Gebhart, F. , and Hall, T. , 23(9):121–126 (Sept. , Jpn. J. Appl. , 22(1):L46–L48 (Jan.

While remarkable advances in thin-film technology have been made, there are still areas in which the technology is leading science. This is particularly true for photo-induced, ion-assisted, and plasma-enhanced processes; these areas should provide fertile ground for future research. ACKNOWLEDGMENTS The authors wish to thank Norman Goldsmith and George L. Schnable, from RCA Laboratories, for critically reviewing the manuscript, and for their many helpful comments and suggestions. ­Maissel, L. ­Vossen, J.

Ch. l, pp. 1-3 to 1-130 in Ref. , Holmwood, R. A. and Kurtz, J. , Ch. 2, pp. 2-1 to 2-142 in Ref. ­Bunshah, R. , Ch. 4, pp. 83–169 in Ref. ­Gossard, A. , in: Treatise on Material Science and Technology, 24:13– 66, (K. N. ­ Singer, P. , Semiconductor International, 6(10):73–80, (Oct. 1983); and 9(10):42–47 (Oct. , Thin Film Science and Technology, Vol. ­Wang, K. , 29(10):137–143 (Oct. ­Chang, L. ­Parker, E. ­Bean, J. ), Proc. First Internat. Symp. on Silicon Molecular Beam Epitaxy, Vol.

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